Allowed: a Look at Refugee Disposition in South Africa

Allowed: a Look at Refugee Disposition in South Africa

APRIL 5 – MAY 4, 2018

Allowed: a Look at Refugee Disposition in South Africa is a solo exhibition of photographs by Zack Chan curated by Delaney Broderick for START.dt. Chan traveled to Johannesburg, South Africa in the summer of 2017 as a Richter Scholar, using the process of taking refugees’ photographs as a means of opening conversation with them about their experiences. The images included in this exhibition explore the narratives shared by Chan’s subjects, both of displacement from their homelands and the rewards and challenges of integration into South African life.

–

Zack Chan is a senior Accounting major with a minor in Studio Art. He has lent his skill in photography to myriad campus organizations and events in his time at Wake Forest. Chan was granted the opportunity to travel to South Africa as a Richter Scholar, where he spent five weeks volunteering at the Jesuit Refugee Service, a non-profit advocacy group which facilitated his interaction with refugees.

Delaney Broderick is a senior, majoring in Art History and minoring in English. She works at the Charlotte and Philip Hanes Gallery at Wake Forest, and has taken advantage of several other opportunities at the university to enrich her academic experience in the Art History program, including a recent trip to New York City for site visits in the Visual Arts Management course. Broderick took an interest in Zack’s photography from South Africa soon after he returned, and as curator she hopes to illustrate parallels between the personal and political situations Zack encountered in his travels and the current political climate in the United States.

–

Zack Chan urges those interested in supporting the work of the Jesuit Refugee Service to research and contribute to the organization.

Works in this exhibition are not for sale.